Poly(2-diphenylamino-1,4-phenylenevinylene): Its preparation via chemical vapor deposition polymerization
نویسندگان
چکیده
منابع مشابه
Graphene sheets via microwave chemical vapor deposition
Centre Of Super-Diamond and Advanced Films (COSDAF), Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China Department of Physics and Materials Science, City University of Hong Kong, Hong Kong SAR, China c Functional Nano & Soft Materials Laboratory (FUNSOM), Soochow University, Suzhou, Jiangsu 215123, China d Laboratory of Optoelectronic Functional Mate...
متن کاملUltralight boron nitride aerogels via template-assisted chemical vapor deposition
Boron nitride (BN) aerogels are porous materials with a continuous three-dimensional network structure. They are attracting increasing attention for a wide range of applications. Here, we report the template-assisted synthesis of BN aerogels by catalyst-free, low-pressure chemical vapor deposition on graphene-carbon nanotube composite aerogels using borazine as the B and N sources with a relati...
متن کاملPolymeric Fluorocarbon Films via Hot-Filament Chemical Vapor Deposition
Hot Filament Chemical Vapor Deposition (HFCVD) offers the ability to tailor the chemistry of films with polymeric structure. In particular, HFCVD allows for more control over precursor fragmentation pathways than conventional plasma-enhanced CVD (PECVD). HFCVD uses thermal activation in the gas phase to generate reactive species, and allows independent control of the substrate temperature to be...
متن کاملSpatially controllable chemical vapor deposition
Most conventional chemical vapor deposition (CVD) systems do not have the spatial actuation and sensing capabilities necessary to control deposition uniformity, or to intentionally induce nonuniform deposition patterns for single-wafer combinatorial CVD experiments. In an effort to address this limitation, a novel CVD reactor system has been developed that can explicitly control the spatial pro...
متن کاملPlasmon-assisted chemical vapor deposition.
We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Science and Technology of Advanced Materials
سال: 2006
ISSN: 1468-6996,1878-5514
DOI: 10.1016/j.stam.2006.05.005